Yield Management & Advanced Process Control
MKS, Yield Dynamics Products is the leading provider of enterprise yield management and advanced process control (APC) software for semiconductor and flat panel display (FPD) manufacturers, as well as fabless chip design companies. Our extensible software analysis and database platform enables our customers to quickly identify and correct semiconductor and FPD production failures, achieving faster product ramps and higher yields. The world's foremost microprocessor manufacturers, memory manufacturers, semiconductor foundries, fabless semiconductor companies, and consumer electronics companies rely on our products as an integral part of their manufacturing processes to optimize yields.
Products:
Yield Management. Genesis™ software delivers parametric, defect and memory solutions in a cost-effective and extensible software platform, enabling data analysis, automated decision making through patented data mining, and custom methodology development through workflow and scripting. Specialized analysis algorithms identify and correct spatial anomalies, wafer processing sequence problems, commonality of effects, detection of outliers and trends, and yield modeling to assess the impact of the design on the "manufacturability" of the resulting chip. Versions are offered for enterprise and fabless customers.
Flat Panel Display. To meet the escalating production challenges posed by increasing plate sizes and screen resolutions in TFT-LCD fabrication, Genesis FPD™ provides a platform-based software solution to find root causes of yield issues, determining the process equipment, defect classes, sizes and layers that are most likely to cause fatal and expensive pixel failures.
Advanced Process Control (APC). enTune™ software platform is a highly automated control system that constantly monitors chips and tools, and makes modifications to the production process automatically to compensate for systematic errors. By analyzing data in real time, changes to the recipe are made to compensate for problems reflected in the data; those changes are communicated back to the tools ("feedback" changes to machines that are making systematic errors, and "feed-forward" to downstream tools to compensate for errors that have already been made). We offer a complete APC infrastructure for real-time control to scale entire wafer fabs, as well as a suite of applications to control and monitor crucial processing tools such as steppers (the lithography process, compensating for errors in overlay and critical dimension), etchers, deposition, and Chemical Mechanical Planarization ("CMP") tools.