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Yield Dynamics Announces enTune™ APC Software

Enterprise software is the first suite of run-to-run advanced process control
applications available to semiconductor manufacturers

Santa Clara, CA, December 4, 2002 – Yield Dynamics, Inc. (YDI), the technology leader in semiconductor yield management and process control software, today announced the commercial release of enTune, its second-generation advanced process control (APC) product. Building on the installed base of MAPA, Yield Dynamics' first generation APC product, enTune provides the only enterprise framework-based run-to-run control solution for semiconductor manufacturers available with a full suite of advanced control applications, including photolithography (overlay as well as CD), chemical-mechanical polish (CMP), etch, and chemical vapor deposition (CVD).

"Early adopters of run-to-run control technology have increased overall profitability and saved hundreds of millions of dollars in previously unavoidable manufacturing costs," said Dr. Jonathan Buckheit, YDI's CEO and president. "enTune allows our customers to realize similar benefits without the significant internal development costs required to implement a fab-wide APC methodology."

According to Dr. Anthony Toprac, director of YDI's APC Development Center in Austin, Texas, "The enTune product leap-frogs the point solutions dedicated to single applications such as photolithography that characterize run-to-run control systems on the market today. As a framework-based system that is scaleable to the enterprise, enTune fully supports interoperation of multiple control loops and the migration to fab-wide control strategies."

Another enTune advantage is its seamless integration with YDI's Genesis product, the most advanced software commercially available for yield management and data mining. Combining with Genesis provides powerful capabilities for supporting control model development and monitoring controller performance. Supported 24x7 by a worldwide network, enTune is the industry's most complete run-to-run control solution, offering advanced proprietary technologies developed in conjunction with leading universities and semiconductor manufacturers.

Proven Reliable Architecture

The enTune server framework provides the same user interfaces and configuration methods across all applications, minimizing the fab's training and system administration requirements. Implemented using the latest in distributed computing technologies, enTune server has the proven 24x7 reliability needed in high-volume manufacturing.

Full Suite of High Value Applications

enTune's suite of off-the-shelf run-to-run control modules offers immediate return on investment without the long development cycle required for building new applications. PhotoCD ensures critical dimensions are on target, providing huge boosts in revenue from improved yields and tighter part performance distributions. The Overlay application relieves fab engineers of maintaining stepper and scanner registration corrections, automatically considering tool, reticle, and reference layer effects. OxideCMP provides a polish recipe tailored to the requirements of each lot or wafer, virtually eliminating the need for pilot-wafer qualifications in the CMP process. PVD/CVD automatically adjusts deposition times to minimize the impact of consumable degradation or chamber-state changes. The enTune Etch application provides a "virtual endpoint" for processes without stop layers for in-situ endpoint, driving process capabilities to previously unattainable levels.

APC has repeatedly proven to be invaluable in increasing process capability and throughput while reducing rework rates and test wafer usage in high-volume manufacturing. Based on YDI's broad experience in solving leading-edge issues in yield management and process control, enTune is the first product to offer these capabilities in a comprehensive suite of applications.

Trademarks

Yield Dynamics, Genesis and enTune are trademarks or registered trademarks of Yield Dynamics, Inc.

About Yield Dynamics

Headquartered in Santa Clara, Calif., Yield Dynamics, Inc. ("YDI") is the technology leader in yield management and advanced process control for the semiconductor industry. YDI provides the most comprehensive set of software tools available, enabling users to convert large amounts of data into useful information that allows them to ramp products rapidly and achieve higher yields. Additional information about Yield Dynamics can be found at http://www.ydyn.com or by calling (408) 330-9320.