enTune™ APC
Genesis Enterprise™
Genesis Fabless™
Genesis FPD™
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enTune™ APC

Recently, Advanced Process Control has been gaining widespread acceptance throughout the semiconductor industry as a means of increasing process capability. In particular, run-to-run control has been shown by major chip manufacturers to significantly increase process capability, line yield and sort yield, while simultaneously decreasing rework costs, cycle time, and wafer scrap.

enTune™ is a suite of cutting-edge advanced process control software applications that provide automated feedback and feedforward control in semiconductor manufacturing processes. Using Yield Dynamics' Streamline Run-to-Run Control™ methodology, enTune™ monitors pre and post-process metrology and then dynamically calculates recipe settings that optimize yield for each processed lot.

The following APC Run-to-Run Control applications are available with the enTune™ suite:

	PhotoCD: fine-tunes exposure to ensure critical dimensions meet target
	Overlay: adjusts stepper offsets to minimize registration errors
	OxideCMP: regulates polish time to maintain correct film thickness
	Etch: controls etch time to reduce variation in post-etch dimensions
	CVD: modifies deposition time to keep film thickness to spec target.

enTune™ is built on the most advanced and robust software technology proven today. The extensibility and scalability of enTune™ architecture ensures viability for many years into the future.

enTune Key Features and Benefits

	Platform-independent Web-based application
	System maintains the same user interface and configuration methods across all applications, minimizing a fab's training and system administration requirements
	Stable API allows for ease of integration
	Messaging component allows for rapid system messaging and alarm processing within the enTune™ system
	Direct links to the entire Yield Dynamics Genesis™ suite of products for enhanced fab-wide analysis and control.