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Publications
2003
2002
2001
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A
Comparison of Run-to-Run Control Algorithms: A Tutorial. Proc.
Sematech AEC/APC Workshop XIII, October, 2001. |
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A Survey
of Run-to-Run Control Algorithms. Proc. Sematech AEC/APC
Workshop XIII, October, 2001. |
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Selected
Publications on Run-to-Run Control. Proc. Sematech AEC/APC
Workshop XIII, October, 2001. |
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APC
Software for 300 mm Fabs. Semiconductor International,
August, 2001. |
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An Overview
and Evaluation of Decision Tree Methodology. Proc. ASA
Conf. on Quality and Productivity, May, 2001. |
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Advanced
Statistical Process Control: Controlling sub-0.18µm Lithography and
Other Processes. SPIE Microlithography, Vol. 4344,
No. 39, March, 2001. |
2000
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Challenges
for Use of Statistical Software Tools in the Semiconductor Industry.
Proc. Joint Statistical Meetings (JSM2000), August, 2000. |
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Life
Beyond Mix-and-Match: Controlling Sub-0.18µm Overlay Errors.
Semiconductor International, July, 2000. |
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Data
Mining for Yield Improvements. Proc. Int'l Conf. on
Modeling and Analysis of Semiconductor Manufacturing (MASM2000),
May, 2000. |
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Predictive
Process Control for Sub-0.2µm Lithography. SPIE
Microlithography, Vol. 3998, No. 48, March, 2000. |
1999

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